| Обозначение | Заглавие на русском языке | Статус | Язык документа | Цена (с НДС 20%)
в рублях |
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Micro-electromechanical system technology - General rules for the assessment of micro-mechanical parameters
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Published |
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На языке оригинала
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1786,00
|
|
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Micro-electromechanical system technology - General rules for the assessment of micro-geometrical parameters
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
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Silicon-based MEMS fabrication technology - The basic regulation of layout design
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Published |
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На языке оригинала
|
1786,00
|
|
|
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Silicon-based MEMS fabrication technology - Specification for KOH etch process
|
Published |
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На языке оригинала
|
1670,00
|
|
|
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Silicon-based MEMS fabrication technology - Specification for the dissolved wafer process
|
Published |
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На языке оригинала
|
1786,00
|
|
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Silicon-based MEMS fabrication technology - Measurement method of cutting and pull-press strength of micro bonding area
|
Published |
|
На языке оригинала
|
2477,00
|
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Silicon-based MEMS fabrication technology—Specification for criterion of the SOI wafer based MEMS process
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Published |
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На языке оригинала
|
1786,00
|
|
|
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Silicon-based MEMS fabrication technology—Specification for criterion of the bulk silicon piezoresistance process
|
Published |
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На языке оригинала
|
2822,00
|
|
|
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Silicon-based MEMS fabrication technology—Specification for criterion of the combination of the deep etching and bonding process
|
Published |
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На языке оригинала
|
2189,00
|
|
|
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Nanotechnologies—Electrical operating parameter test specification of wafer level nano-scale phase change memory cells
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Published |
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На языке оригинала
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2131,00
|
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Wafer level test methods for MEMS piezoresistive pressure-sensitive die performances
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Published |
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На языке оригинала
|
1786,00
|
|
|
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Test methods of the performance for MEMS high g accelerometer
|
Published |
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На языке оригинала
|
1786,00
|
|
|
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Micro-electromechanical system technology—Measuring method for in-plane length measurements of MEMS microstructures using an optical interferometer
|
Published |
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На языке оригинала
|
1670,00
|
|
|
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Micro-electromechanical system technology—Measuring method for strain gradient measurements of MEMS microstructures using an optical interferometer
|
Published |
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На языке оригинала
|
1786,00
|
|
|
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Micro electromechanical system technology—Test method for the nonlinear vibration of the MEMS resonant sensitive element
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Published |
|
На языке оригинала
|
1786,00
|
|
|
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Micro-electromechanical system technology—Measuring method of microstructure surface stress based on Raman spectroscopy
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Published |
|
На языке оригинала
|
1786,00
|
|
|
|
Micro-electromechanical system technology—Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
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Microwave circuits—Measuring methoels for noise source
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Published |
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На языке оригинала
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1670,00
|
|
|
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Microwave circuits—Measuring methods for frequency source
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Published |
|
На языке оригинала
|
2189,00
|
|
|
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Test methods for endurance and data retention of non-volatile memory
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Published |
|
На языке оригинала
|
1670,00
|
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| Страницы: 1 / 2 / 3 / 4 / 5 / 6 / 7 / 8 |