| Обозначение | Заглавие на русском языке | Статус | Язык документа | Цена (с НДС 20%)
в рублях |
|
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Surface chemical analysis - Auger electron spectroscopy - Repeatability and constancy of intensity scale
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
|
Surface chemical analysis - Analysis of zinc and/or aluminium based metallic coatings by glow discharge optical emission spectrometry
|
Published |
|
На языке оригинала
|
3110,00
|
|
|
|
Surface chemical analysis - High resolution auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis
|
Published |
|
На языке оригинала
|
2822,00
|
|
|
|
Surface chemical analysis—Medium resolution auger electron spectrometers—Calibration of energy scales for elemental analysis
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
|
Surface chemical analysis―Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
|
Published |
|
На языке оригинала
|
2477,00
|
|
|
|
Surface chemical analysis―Auger electron spectroscopy and X-ray photoelectron spectroscopy―Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
|
Published |
|
На языке оригинала
|
2822,00
|
|
|
|
Surface chemical analysis―X-ray photoelectron spectroscopy―Guidelines for analysis
|
Published |
|
На языке оригинала
|
2822,00
|
|
|
|
Surface chemical analysis―Guidelines for preparation and mounting of specimens for analysis
|
Published |
|
На языке оригинала
|
2477,00
|
|
|
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Determination of total organic carbon(TOC) in industrial circulating cooling water
|
Published |
|
На языке оригинала
|
1382,00
|
|
|
|
Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
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Surface chemical analysis—Recording and reporting data in Auger electron spectroscopy (AES)
|
Published |
|
На языке оригинала
|
2131,00
|
|
|
|
Surface chemical analysis—Analysis of metal oxide films by glow-discharge optical emission spectrometry
|
Published |
|
На языке оригинала
|
3398,00
|
|
|
|
Surface chemical analysis—General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
|
Published |
|
На языке оригинала
|
3398,00
|
|
|
|
Surface chemical analysis—Auger electron spectroscopy—Reporting of methods used for charge control and charge correction
|
Published |
|
На языке оригинала
|
2822,00
|
|
|
|
Surface chemical analysis—Depth profiling—Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
|
Published |
|
На языке оригинала
|
2477,00
|
|
|
|
Water treatment chemical—Determination of arsenic and mercury—Atomic fluorescence spectrometry
|
Published |
|
На языке оригинала
|
1382,00
|
|
|
|
Polycrystalline silicon—Determination of trace elements—Glow discharge mass spectrometry method
|
Published |
|
На языке оригинала
|
1786,00
|
|
|
|
Gas analysis—Determination of sulfide—Gas chromatography with sulfur chemiluminescence
|
Published |
|
На языке оригинала
|
2189,00
|
|
|
|
Gas analysis—Guidelines for purification of gases for trace analysis instrument
|
Published |
|
На языке оригинала
|
2189,00
|
|
|
|
Determination of hydrogen sulfide carbonyl sulfide methanethiol and dimethyl sulfide in coal-based syngas—Gas chromatograph
|
Published |
|
На языке оригинала
|
1670,00
|
|
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